Effects of nitrogen fraction on the structure of amorphous silicon-carbon-nitrogen alloys

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 562-566

  Gao, Y ^a   Wei, J ^b   Zhang, D H ^a   Mo, Z Q ^c   Hing, P ^a   Shi, X ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^c Materials Processing Center   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; FILM PREPARATION; GRAPHITE; MAGNETRON SPUTTERING; NITROGEN; PRESSURE EFFECTS; SILICON COMPOUNDS; TARGETS;

NITROGEN FRACTION; SILICON CARBON NITROGEN ALLOYS;

AMORPHOUS FILMS;

EID: 0034509127     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01292-X     Document Type: Article

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