Thin film deposition and surface modification with atmospheric pressure dielectric barrier discharges

Surface and Coatings Technology

Volumn 205, Issue 5, 2010, Pages 1536-1543

  Fanelli, Fiorenza ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

Atmospheric pressure; Dielectric barrier discharge; Fluorocarbon; Organosilicon; Plasma diagnostics; Thin film deposition

Indexed keywords

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; CHEMICAL COMPOSITIONS; CHEMICAL STRUCTURE; DIAGNOSTIC TECHNIQUES; DIELECTRIC BARRIER DISCHARGES; DISCHARGE BEHAVIOUR; DISCHARGE REGIMES; ELECTRICAL CHARACTERISTIC; FEED GAS; FEED RATIOS; FLUORO-POLYMERS; GC-MS ANALYSIS; HEXAMETHYL DISILOXANE; LOW PRESSURE PLASMA; ORGANO-SILICON PRECURSOR; ORGANOSILICONES; PLASMA CHEMISTRIES; SEM; STATE OF THE ART; SUBSTRATE PROPERTIES; SURFACE MODIFICATION; SURFACE PROCESSING; THIN FILM DEPOSITION; THIN-FILM DEPOSITIONS; XPS;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC COMPOSITION; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CHEMICAL CONTAMINATION; DEPOSITS; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; EMISSION SPECTROSCOPY; FLOW CONTROL; FLUORINE CONTAINING POLYMERS; OPTICAL EMISSION SPECTROSCOPY; OXYGEN; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; SILICON COMPOUNDS; SURFACE DISCHARGES; THIN FILMS; VAPOR DEPOSITION;

GAS PERMEABLE MEMBRANES;

EID: 78649910686     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.07.100     Document Type: Article

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