On the formation mechanisms of the diffuse atmospheric pressure dielectric barrier discharge in CVD processes of thin silica-like films

Plasma Sources Science and Technology

Volumn 18, Issue 4, 2009, Pages

  Starostin, S A ^a,b   Premkumar, P Antony ^a,b   Creatore, M ^b   Van Veldhuizen, E M ^b   De Vries, H ^c   Paffen, R M J ^c   Van De Sanden, M C M ^b  

^a MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c FUJIFILM Manufacturing Europe BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; COST-EFFICIENT; CURRENT SPOTS; CVD PROCESS; DIELECTRIC BARRIER DISCHARGES; ELECTRICAL DIAGNOSTICS; ELECTRODE AREAS; FAST IMAGING; FORMATION MECHANISM; HEXAMETHYL DISILOXANE; HIGH CURRENT DENSITIES; LOW CURRENTS; MICRODISCHARGES; MODEL SYSTEM; PATHWAYS OF FORMATION; POLYMERIC SUBSTRATE; SUBSTRATE SURFACE; TEMPORAL EVOLUTION;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DIELECTRIC DEVICES; FLOW CONTROL; GAS MIXTURES; GAS PERMEABLE MEMBRANES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILICA;

ELECTRIC DISCHARGES;

EID: 70350647304     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/4/045021     Document Type: Article

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