High quality SiO2-like layers by large area atmospheric pressure plasma enhanced CVD: Deposition process studies by surface analysis

Plasma Processes and Polymers

Volumn 6, Issue 10, 2009, Pages 693-702

  Premkumar, Peter Antony ^a,b   Starostin, Sergey A ^a,b   De Vries, Hindrik ^c   Paffen, Roger M J ^c   Creatore, Mariadriana ^b   Eijkemans, Tom J ^b   Koenraad, Paul M ^b   Van De Sanden, Mauritius C M ^b  

^a MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c FUJIFILM Manufacturing Europe BV   (Netherlands)

Author keywords

Atmospheric pressure glow discharges (APGD); Atomic force microscopy (AFM); Dielectric barrier discharges (DBD); Films; Hexamethyldisiloxane (HMDSO); Roll to roll reactor

Indexed keywords

ATMOSPHERIC PRESSURE GLOW DISCHARGE; DIELECTRIC BARRIER DISCHARGES; DIELECTRIC BARRIER DISCHARGES (DBD); HEXAMETHYL DISILOXANE; ROLL TO ROLL;

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; DIELECTRIC DEVICES; GLOW DISCHARGES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYMER FILMS; POLYMERS; SILICON COMPOUNDS; SURFACE ANALYSIS;

GAS PERMEABLE MEMBRANES;

EID: 70450216099     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900033     Document Type: Article

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