High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films

Applied Physics Letters

Volumn 96, Issue 6, 2010, Pages

  Starostin, S A ^a,b   Premkumar, P Antony ^a,b   Creatore, M ^b   De Vries, H ^c   Paffen, R M J ^c   Van De Sanden, M C M ^b  

^a MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c FUJIFILM Manufacturing Europe BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AIR FLOW; ATMOSPHERIC PRESSURE AIR; CURRENT PULSE; DIELECTRIC BARRIER DISCHARGES; EXPOSURE-TIME; FAST DISCHARGES; FILM DEPOSITION; FREE LAYERS; HEXAMETHYL DISILOXANE; HIGH CURRENTS; MORPHOLOGY AND COMPOSITION; PLASMA UNIFORMITY; ROLL TO ROLL; SUBSTRATE ROUGHNESS; THIN-FILM DEPOSITIONS; ULTRA-SMOOTH FILMS;

ATMOSPHERIC PRESSURE; CARBON FILMS; DEPOSITION; DIELECTRIC DEVICES; FLOW CONTROL; PLASMA APPLICATIONS; PLASMAS; SILICA;

POLYMERIC FILMS;

EID: 76749096901     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3310024     Document Type: Article

References (22)

1. U. Kogelschatz, Plasma Chem. Plasma Process. 0272-4324 23, 1 (2003). 10.1023/A:1022470901385 (Pubitemid 36257393)
2. A. Sonnenfeld, T. M. Tun, L. Zakickova, K. V. Kozlov, H. -E. Wagner, J. F. Behnke, and R. Hippler, Plasmas Polym. 1084-0184 6, 237 (2001). 10.1023/A:1014414016164 (Pubitemid 35405652)
3. F. Massines, N. Gheradi, A. Fornelli, and S. Martin, Surf. Coat. Technol. 0257-8972 200, 1855 (2005). 10.1016/j.surfcoat.2005.08.010 (Pubitemid 41762207)
4. S. E. Alexandrov and M. L. Hitchman, Chem. Vap. Deposition 0948-1907 11, 457 (2005). 10.1002/cvde.200500026 (Pubitemid 43040008)
5. S. Starostine, E. Aldea, H. de Vries, M. Creatore, and M. C. M. van de Sanden, Plasma Processes Polym. 1612-8850 4, S440 (2007). 10.1002/ppap.200731203
6. P. Antony Premkumar, S. A. Starostin, H. de Vries, R. M. J. Paffen, M. Creatore, T. J. Eijkemans, P. M. Koenraad, and M. C. M. van de Sanden, Plasma Processes Polym. 1612-8850 6, 693 (2009). 10.1002/ppap.200900033
7. S. Okazaki, M. Kogoma, M. Uehara, and Y. Kimura, J. Phys. D 0022-3727 26, 889 (1993). 10.1088/0022-3727/26/5/025
8. E. Aldea, P. Peeters, H. de Vries, and M. C. M. van de Sanden, Surf. Coat. Technol. 0257-8972 200, 46 (2005). 10.1016/j.surfcoat.2005.01.052 (Pubitemid 41268915)
9. F. Massines, N. Gherardi, N. Naude, and P. Segur, Eur. Phys. J.: Appl. Phys. 1286-0042 47, 22805 (2009). 10.1051/epjap/2009064
10. D. Magni, Ch. Deschenaux, Ch. Hollenstein, A. Creatore, and P. Fayet, J. Phys. D 0022-3727 34, 87 (2001). 10.1088/0022-3727/34/1/315 (Pubitemid 32136869)
11. F. Kaddouri, G. D. Stancu, D. A. Lacoste, and C. O. Laux, J. Phys.: Conf. Ser. 1742-6588 157, 012005 (2009). 10.1088/1742-6596/157/1/012005
12. J. R. Roth, J. Rahel, X. Dai, and D. M. Sherman, J. Phys. D 0022-3727 38, 555 (2005). 10.1088/0022-3727/38/4/007 (Pubitemid 40297504)
13. Z. Fang, Y. Qiu, and Y. Luo, J. Phys. D 0022-3727 36, 2980 (2003). 10.1088/0022-3727/36/23/019
14. J. Ráhel and D. M. Sherman, J. Phys. D 0022-3727 38, 547 (2005). 10.1088/0022-3727/38/4/006 (Pubitemid 40297503)
15. J. M. Meek and J. D. Craggs, Electrical Breakdown of Gases (Wiley, New York, 1978).
16. M. Li, C. Li, H. Zhan, J. Xu, and X. Wang, Appl. Phys. Lett. 0003-6951 92, 031503 (2008). 10.1063/1.2838340 (Pubitemid 351160600)
17. E. Aldea, J. Bastiaan, M. C. M. van de Sanden, and H. W. de Vries, US2007210721 (2007).
18. Yu. P. Raizer, Gas Discharge Physics (Springer, Berlin, 1991).
19. S. A. Starostin, P. Antony Premkumar, M. Creatore, E. M. van Veldhuizen, H. de Vries, R. M. J. Paffen, and M. C. M. van de Sanden, Plasma Sources Sci. Technol. 0963-0252 18, 045021 (2009). 10.1088/0963-0252/18/4/045021
20. D. R. Anderson, Analysis of Silicones (Wiley, New York, 1974).
21. P. J. Launer, Silicon Compounds Register and Review (Petrarch Systems, Bristol, 1987).
22. V. Raballand, J. Benedikt, and A. von Keudell, Appl. Phys. Lett. 0003-6951 92, 091502 (2008). 10.1063/1.2844880 (Pubitemid 351357363)