Infrared spectroscopic analysis of siloxane network modification of mesoporous silica film by silylation and cesium doping

Thin Solid Films

Volumn 519, Issue 2, 2010, Pages 674-680

  Kayaba, Yasuhsia ^a   Kohmura, Kazuo ^b   Tanaka, Hirofumi ^b   Seino, Yutaka ^c   Ohdaira, Toshiyuki ^c   Chikaki, Shinichi ^d   Kikkawa, Takamaro ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

^b MITSUI CHEMICALS INC   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^d SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Fourier Transform Infrared Spectroscopy; Low Dielectric Constant; Mesoporous Silica; Porous Silica; Silica; Silylation

Indexed keywords

DISPERSION ANALYSIS; HEXAMETHYLDISILAZANE; INFRARED SPECTROSCOPIC ANALYSIS; INFRARED SPECTRUM; LONGITUDINAL OPTICAL; LOW DIELECTRIC CONSTANTS; MESOPOROUS SILICA; MESOPOROUS SILICA FILM; MESOPOROUS SILICAS; NETWORK CONNECTIVITY; OSCILLATOR STRENGTHS; PORE SURFACE; POROUS SILICA; PRECURSOR SOLUTIONS; SELF-ASSEMBLING; SILOXANE BONDING; SILYLATIONS; SOL-GEL METHODS; TETRA METHYL CYCLO TETRA SILOXANES; TRANSVERSE OPTICAL; VAPOR PHASE;

CESIUM; DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GELS; IONIC STRENGTH; OXYGEN; PERMITTIVITY; SOL-GEL PROCESS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPY; SPECTRUM ANALYSIS; SURFACE ACTIVE AGENTS; VIBRATION ANALYSIS;

SILICA;

EID: 77958485610     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.109     Document Type: Article

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