Structural and electrical properties of ultralow-k, disordered mesoporous silica films synthesized using nonionic templates

Journal of the Electrochemical Society

Volumn 151, Issue 10, 2004, Pages

  Yamada, Kazuhiro ^a   Oku, Yoshiaki ^a   Hata, Nobuhiro ^b   Seino, Yutaka ^b   Negoro, Chie ^b   Kikkawa, Takamaro ^b,c  

^a Assoc Super Adv Electronics T   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; COPOLYMERS; ELASTIC MODULI; IONS; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

MESOPOROUS FILMS; PORE STRUCTURES; PRECUSOR SOLUTION; SILICA FILMS;

SILICA;

EID: 8644259255     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1795258     Document Type: Article

References (8)

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