Theoretical investigation into effects of pore size and pore position distributions on dielectric constant and elastic modulus of two-dimensional periodic porous silica films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 3, 2005, Pages 1166-1168

  Miyoshi, Hidenori ^a   Hata, Nobuhiro ^b   Kikkawa, Takamaro ^b,c  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Dielectric constant; Elastic modulus; Hexagonal; Periodic porous silica; Pore position distribution; Pore size distribution; Porosity; Two dimensional structure; Ultralow k

Indexed keywords

ELASTIC MODULI; PERMITTIVITY; PORE SIZE; POROSITY; POROUS SILICON; SHRINKAGE; SILICA; STRENGTH OF MATERIALS;

HEXAGONAL; PERIODIC POROUS SILICA; PORE POSITION DISTRIBUTION; TWO-DIMENSIONAL STRUCTURE; ULTRALOW-K;

THIN FILMS;

EID: 19944385647     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.1166     Document Type: Article

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