Fabrication of mesoporous silica for ultra-low-k interlayer dielectrics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6002, Issue , 2005, Pages

  Fujii, Nobutoshi ^a,b   Kohmura, Kazuo ^a   Nakayama, Takahiro ^a   Tanaka, Hirofumi ^a   Hata, Nobuhiro ^b   Seino, Yutaka ^b   Kikkawa, Takamaro ^b,c  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Dielectric constant; Low k; Mechanical strength; Mesoporous silica; Spin on dielectric

Indexed keywords

CATALYSTS; DIELECTRIC FILMS; MESOPOROUS MATERIALS; STRENGTH OF MATERIALS; SURFACE ACTIVE AGENTS;

LOW-K; MESOPOROUS SILICA; SPIN ON DIELECTRIC;

SILICA;

EID: 33644647596     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633597     Document Type: Conference Paper

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