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Applied Physics Letters

Volumn 94, Issue 9, 2009, Pages

Pore orientation and silylation effects on mesoporous silica film properties

(8) Singh, A P a Gandhi, D D a Singh, B a Simonyi, E b Liniger, E G b Nitta, S V b Lane, M W c Ramanath, G a

a RENSSELAER POLYTECHNIC INSTITUTE (United States)

b IBM T J WATSON RESEARCH CENTER (United States)

c EMORY AND HENRY COLLEGE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL STABILITY; LEAKAGE CURRENTS; MAGNETOPLASMA; MECHANICAL PROPERTIES; PASSIVATION; PORE STRUCTURE; SILICA; THREE DIMENSIONAL;

BOND-BREAKING; COPPER DIFFUSIONS; CYLINDRICAL PORES; LOW DIELECTRICS; MESOPOROUS SILICA FILMS; MESOPOROUS SILICAS; MULTILEVEL WIRINGS; NANO-DEVICES; PORE ORIENTATIONS; SILYLATION; THREE-DIMENSIONAL PORES;

SILANES;

EID: 62149123953 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3081388 Document Type: Article

Times cited : (13)

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