Skeletal silica characterization in porous-silica low-dielectric-constant films by infrared spectroscopic ellipsometry

Journal of Applied Physics

Volumn 97, Issue 11, 2005, Pages

  Takada, Syozo ^a   Hata, Nobuhiro ^a   Seino, Yutaka ^a   Fujii, Nobutoshi ^b   Kikkawa, Takamaro ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Millenium Res for Adv Information Technology Association of Super Advanced Electronics Technology   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FUNCTIONS; INFRARED SPECTROSCOPIC ELLIPSOMETRY; SKELETAL SILICA STRUCTURES; YOUNG'S ELASTIC MODULUS;

CHEMICAL BONDS; DIFFERENTIAL SCANNING CALORIMETRY; ELASTIC MODULI; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; SURFACE ACTIVE AGENTS; THERMAL EFFECTS; THIN FILMS;

SILICA;

EID: 20544461138     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1903108     Document Type: Article

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