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Volumn 48, Issue 12, 2009, Pages

Quantitative determination of complex dielectric function of amorphous silicon dioxide on silicon substrate from transmission spectrum

(2) Kayaba, Yasuhisa a Kikkawa, Takamaro a

a HIROSHIMA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON DIOXIDE; COMPLEX DIELECTRIC FUNCTIONS; DIELECTRIC FUNCTIONS; EXPERIMENTAL DATA; IMAGINARY PARTS; INCIDENCE ANGLES; INFRARED REGIONS; LAMINATED STRUCTURES; LONGITUDINAL OPTICS; LORENTZ; MOLECULAR BONDING; OPTICAL MODELS; OXIDE THIN FILMS; PARAMETERIZED; PARAMETRIC ANALYSIS; PEAK FREQUENCIES; QUANTITATIVE DETERMINATIONS; SILICON DIOXIDE; SILICON SUBSTRATES; SILOXANE BONDING; TRANSMISSION SPECTRUMS; TRANSVERSE OPTICS;

ADSORPTION; INFRARED SPECTROSCOPY; OXIDE FILMS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; THIN FILMS;

AMORPHOUS SILICON;

EID: 75149169696 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.121406 Document Type: Article

Times cited : (6)

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