Mechanical properties of organosilicon thin films deposited from cyclic and acyclic precursors using water as an oxidant

Materials Research Society Symposium - Proceedings

Volumn 766, Issue , 2003, Pages 273-278

  Burkey, Daniel D ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; HARDNESS; OXIDATION; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILANES; WATER;

OXIDANT; PULSED-PLASMA CHEMICAL VAPOR DEPOSITION; SILOXANE;

THIN FILMS;

EID: 0346938382     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-766-e6.7     Document Type: Article

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