-
1
-
-
85014612976
-
Toward engineering modeling of negative bias temperature instability
-
D. M. Fleetwood, S. T. Pantelides, and R. D. Schrimpf, Eds. Boca Raton, London, New York: CRC Press
-
T. Grasser, W. Goes, and B. Kaczer, "Toward engineering modeling of negative bias temperature instability," in Defects in Microelectronic Materials and Devices, D. M. Fleetwood, S. T. Pantelides, and R. D. Schrimpf, Eds. Boca Raton, London, New York: CRC Press, 2009, pp. 399-436.
-
(2009)
Defects in Microelectronic Materials and Devices
, pp. 399-436
-
-
Grasser, T.1
Goes, W.2
Kaczer, B.3
-
2
-
-
84855922022
-
Negative bias temperature instabilities in pMOSFET devices
-
A. W. Strong, E. Y. Wu, R. P. Vollertsen, J. Sune, G. LaRosa, S. E. Rauch, and R. P. Sullivan, Eds. Hoboken: Wiley
-
G. LaRosa, "Negative bias temperature instabilities in pMOSFET devices," in Reliability Wearout Mechanisms in Advanced CMOS Technologies, A. W. Strong, E. Y. Wu, R. P. Vollertsen, J. Sune, G. LaRosa, S. E. Rauch, and R. P. Sullivan, Eds. Hoboken: Wiley, 2009, pp. 331-439.
-
(2009)
Reliability Wearout Mechanisms in Advanced CMOS Technologies
, pp. 331-439
-
-
LaRosa, G.1
-
3
-
-
34247891689
-
Negative bias temperature instability: What do we understand?
-
D. K. Schroder, "Negative bias temperature instability: What do we understand?," Microelectronics Reliability, pp. 841-852, 2007
-
(2007)
Microelectronics Reliability
, pp. 841-852
-
-
Schroder, D.K.1
-
4
-
-
0038306923
-
Interface defects responsible for NBTI in plasma-nitrided SiON/Si(100) systems
-
S. Fujieda, Y. Miura, M. Saitoh, E. Hasegawa, S. Koyama, and K. Ando, "Interface defects responsible for NBTI in plasma-nitrided SiON/Si(100) systems," Applied Physics Letters, pp. 3677-3679, 2003
-
(2003)
Applied Physics Letters
, pp. 3677-3679
-
-
Fujieda, S.1
Miura, Y.2
Saitoh, M.3
Hasegawa, E.4
Koyama, S.5
Ando, K.6
-
5
-
-
37549070996
-
Atomic-scale defects involved in NBTI
-
J. P. Campbell, P. M. Lenahan, C. J. Cochrane, A. T. Krishnan, and S. Krishnan, "Atomic-scale defects involved in NBTI," IEEE Transactions on Device and Materials Reliability, pp. 540-557, 2007
-
(2007)
IEEE Transactions on Device and Materials Reliability
, pp. 540-557
-
-
Campbell, J.P.1
Lenahan, P.M.2
Cochrane, C.J.3
Krishnan, A.T.4
Krishnan, S.5
-
6
-
-
0037005587
-
Dynamic nbti of p-MOS transistors and its impact on MOSFET scaling
-
G. Chen, M. F. Li, C. H. Ang, J. Z. Zheng, and D. L. Kwong, "Dynamic nbti of p-MOS transistors and its impact on MOSFET scaling," IEEE Electron Device Letters, pp. 734-736, 2002
-
(2002)
IEEE Electron Device Letters
, pp. 734-736
-
-
Chen, G.1
Li, M.F.2
Ang, C.H.3
Zheng, J.Z.4
Kwong, D.L.5
-
7
-
-
0042281583
-
Dynamic recovery of negative bias temperature instability in p-type metal-oxide-semiconductor field-effect transistors
-
M. Ershov, S. Saxena, H. Karbasi, S. Winters, S. Minehane, J. Babcock, R. Lindley, P. Clifton, M. Redford, and A. Shibkov, "Dynamic recovery of negative bias temperature instability in p-type metal-oxide-semiconductor field-effect transistors," Applied Physics Letters, pp. 1647-1649, 2003
-
(2003)
Applied Physics Letters
, pp. 1647-1649
-
-
Ershov, M.1
Saxena, S.2
Karbasi, H.3
Winters, S.4
Minehane, S.5
Babcock, J.6
Lindley, R.7
Clifton, P.8
Redford, M.9
Shibkov, A.10
-
8
-
-
84955259235
-
Negative bias temperature instability of pMOSFETs with ultra-thin SiON gate dielectrics
-
S. Tsujikawa, T. Mine, K. Watanabe, Y. Shimamoto, R. Tsuchiya, K. Ohnishi, T. Onai, J. Yugami, and S. i. Kimura, "Negative bias temperature instability of pMOSFETs with ultra-thin SiON gate dielectrics," IEEE Int. Reliab. Phys. Symp., pp. 183-188, 2003
-
(2003)
IEEE Int. Reliab. Phys. Symp.
, pp. 183-188
-
-
Tsujikawa, S.1
Mine, T.2
Watanabe, K.3
Shimamoto, Y.4
Tsuchiya, R.5
Ohnishi, K.6
Onai, T.7
Yugami, J.8
Kimura, S.I.9
-
9
-
-
84955268499
-
Behavior of NBTI under ac dynamic circuit conditions
-
W. Abadeer and W. Ellis, "Behavior of NBTI under ac dynamic circuit conditions," IEEE Int. Reliab. Phys. Symp., pp. 17-22, 2003
-
(2003)
IEEE Int. Reliab. Phys. Symp.
, pp. 17-22
-
-
Abadeer, W.1
Ellis, W.2
-
10
-
-
84955243454
-
Transient effects and characterization methodology of negative bias temperature instability in pMOS transistors
-
M. Ershov, R. Lindley, S. Saxena, A. Shibkov, S. Minehane, J. Babcock, S. Winters, H. Karbasi, T. Yamashita, P. Clifton, and M. Redford, "Transient effects and characterization methodology of negative bias temperature instability in pMOS transistors," IEEE Int. Reliab. Phys. Symp., pp. 606-607, 2003
-
(2003)
IEEE Int. Reliab. Phys. Symp.
, pp. 606-607
-
-
Ershov, M.1
Lindley, R.2
Saxena, S.3
Shibkov, A.4
Minehane, S.5
Babcock, J.6
Winters, S.7
Karbasi, H.8
Yamashita, T.9
Clifton, P.10
Redford, M.11
-
11
-
-
28744447129
-
Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification
-
B. Kaczer, V. Arkbipov, R. Degraeve, N. Collaert, G. Groeseneken, and M. Goodwin, "Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification," IEEE Int. Reliab. Phys. Symp., pp. 381-387, 2005
-
(2005)
IEEE Int. Reliab. Phys. Symp.
, pp. 381-387
-
-
Kaczer, B.1
Arkbipov, V.2
Degraeve, R.3
Collaert, N.4
Groeseneken, G.5
Goodwin, M.6
-
12
-
-
34247847473
-
Analysis of NBTI degradation-and recovery-behavior based on ultra fast VT-measurements
-
H. Reisinger, O. Blank, W. Heinrigs, A. Muhlhoff, W. Gustin, and C. Schlunder, "Analysis of NBTI degradation-and recovery-behavior based on ultra fast VT-measurements," IEEE Int. Reliab. Phys. Symp., pp. 448-453, 2006
-
(2006)
IEEE Int. Reliab. Phys. Symp.
, pp. 448-453
-
-
Reisinger, H.1
Blank, O.2
Heinrigs, W.3
Muhlhoff, A.4
Gustin, W.5
Schlunder, C.6
-
13
-
-
46049113552
-
Characterization and physical origin of fast vth transient in NBTI of pMOSFETs with SiON dielectric
-
C. Shen, M. F. Li, C. E. Foo, T. Yang, D. M. Huang, A. Yap, G. S. Samudra, and Y. C. Yeo, "Characterization and physical origin of fast vth transient in NBTI of pMOSFETs with SiON dielectric," IEEE IEDM Technical Digest, pp. 333-336, 2006
-
(2006)
IEEE IEDM Technical Digest
, pp. 333-336
-
-
Shen, C.1
Li, M.F.2
Foo, C.E.3
Yang, T.4
Huang, D.M.5
Yap, A.6
Samudra, G.S.7
Yeo, Y.C.8
-
14
-
-
33748111476
-
Observations of NBTI-induced atomic-scale defects
-
J. P. Campbell, P. M. Lenahan, A. T. Krishnan, and S. Krishnan, "Observations of NBTI-induced atomic-scale defects," IEEE Transactions on Device and Materials Reliability, pp. 117-122, 2006
-
(2006)
IEEE Transactions on Device and Materials Reliability
, pp. 117-122
-
-
Campbell, J.P.1
Lenahan, P.M.2
Krishnan, A.T.3
Krishnan, S.4
-
15
-
-
27744503541
-
Direct observation of the structure of defect centers involved in the negative bias temperature instability
-
J. P. Campbell, P. M. Lenahan, A. T. Krishnan, and S. Krishnan, "Direct observation of the structure of defect centers involved in the negative bias temperature instability," Applied Physics Letters, pp. 204106, 2005
-
(2005)
Applied Physics Letters
, pp. 204106
-
-
Campbell, J.P.1
Lenahan, P.M.2
Krishnan, A.T.3
Krishnan, S.4
-
16
-
-
0141457906
-
Atomic scale defects involved in MOS reliability problems
-
P. M. Lenahan, "Atomic scale defects involved in MOS reliability problems," Microelectronic Engineering, pp. 173-181, 2003
-
(2003)
Microelectronic Engineering
, pp. 173-181
-
-
Lenahan, P.M.1
-
17
-
-
34247897087
-
Deep level defects involved in MOS device instabilities
-
P. M. Lenahan, "Deep level defects involved in MOS device instabilities," Microelectronics Reliability, pp. 890-898, 2007
-
(2007)
Microelectronics Reliability
, pp. 890-898
-
-
Lenahan, P.M.1
-
18
-
-
0027853278
-
Molecular-hydrogen, E' center hole traps, and radiation-induced interface traps in MOS devices
-
J. F. Conley and P. M. Lenahan, "Molecular-hydrogen, E' center hole traps, and radiation-induced interface traps in MOS devices," IEEE Transactions on Nuclear Science, pp. 1335-1340, 1993
-
(1993)
IEEE Transactions on Nuclear Science
, pp. 1335-1340
-
-
Conley, J.F.1
Lenahan, P.M.2
-
20
-
-
0029518434
-
Electron spin resonance evidence that e'(gamma) centers can behave as switching oxide traps
-
J. F. Conley, P. M. Lenahan, A. J. Lelis, and T. R. Oldham, "Electron spin resonance evidence that e'(gamma) centers can behave as switching oxide traps," IEEE Transactions on Nuclear Science, pp. 1744-1749, 1995
-
(1995)
IEEE Transactions on Nuclear Science
, pp. 1744-1749
-
-
Conley, J.F.1
Lenahan, P.M.2
Lelis, A.J.3
Oldham, T.R.4
-
26
-
-
0021519639
-
2 interface - Band gap energy distribution
-
2 interface - band gap energy distribution," Journal of Applied Physics, pp. 2844-2849, 1984
-
(1984)
Journal of Applied Physics
, pp. 2844-2849
-
-
Poindexter, E.H.1
Gerardi, G.J.2
Rueckel, M.E.3
Caplan, P.J.4
Johnson, N.M.5
Biegelsen, D.K.6
-
28
-
-
70449122224
-
A two-stage model for negative bias temperature instability
-
T. Grasser, B. Kaczer, W. Goes, T. Aichinger, P. Hehenberger, and M. Nelhiebel, "A two-stage model for negative bias temperature instability," IEEE Int. Reliab. Phys. Symp., pp. 33-44, 2009
-
(2009)
IEEE Int. Reliab. Phys. Symp.
, pp. 33-44
-
-
Grasser, T.1
Kaczer, B.2
Goes, W.3
Aichinger, T.4
Hehenberger, P.5
Nelhiebel, M.6
-
29
-
-
77957892897
-
The time dependent defect spectroscopy (TDDS) for the characterization of the bias temperature instability
-
T. Grasser, H. Reisinger, P. J. Wagner, F. Schanovsky, W. Goes, and B. Kaczer, "The time dependent defect spectroscopy (TDDS) for the characterization of the bias temperature instability," IEEE Int. Reliab. Phys. Symp., pp. 2010
-
IEEE Int. Reliab. Phys. Symp.
, pp. 2010
-
-
Grasser, T.1
Reisinger, H.2
Wagner, P.J.3
Schanovsky, F.4
Goes, W.5
Kaczer, B.6
-
30
-
-
70449089008
-
NBTI from the perspective of defect states with widely distributed time scales
-
B. Kaczer, T. Grasser, J. Martin-Martinez, E. Simoen, M. Aoulaiche, P. J. Roussel, and G. Groeseneken, "NBTI from the perspective of defect states with widely distributed time scales," IEEE Int. Reliab. Phys. Symp., pp. 55-60, 2009
-
(2009)
IEEE Int. Reliab. Phys. Symp.
, pp. 55-60
-
-
Kaczer, B.1
Grasser, T.2
Martin-Martinez, J.3
Simoen, E.4
Aoulaiche, M.5
Roussel, P.J.6
Groeseneken, G.7
-
31
-
-
0017930413
-
Explanation of large spin-dependent recombination effect in semiconductors
-
D. Kaplan, I. Solomon, and N. F. Mott, "Explanation of large spin-dependent recombination effect in semiconductors," Journal De Physique Lettres, pp. L51-L54, 1978
-
(1978)
Journal de Physique Lettres
-
-
Kaplan, D.1
Solomon, I.2
Mott, N.F.3
-
32
-
-
0346539170
-
Spin-dependent recombination on silicon surface
-
D. J. Lepine, "Spin-dependent recombination on silicon surface," Physical Review B, pp. 436-441, 1972
-
(1972)
Physical Review B
, pp. 436-441
-
-
Lepine, D.J.1
-
34
-
-
0021427238
-
Hole traps and trivalent silicon centers in metal-oxide silicon devices
-
P. M. Lenahan and P. V. Dressendorfer, "Hole traps and trivalent silicon centers in metal-oxide silicon devices," Journal of Applied Physics, pp. 3495-3499, 1984
-
(1984)
Journal of Applied Physics
, pp. 3495-3499
-
-
Lenahan, P.M.1
Dressendorfer, P.V.2
|