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Volumn , Issue , 2010, Pages 43-49

Recovery-free electron spin resonance observations of NBTI degradation

Author keywords

E centers; Electron spin resonance; Negative bias temperature instability; On the fly

Indexed keywords

ATOMIC SCALE; DEFECT GENERATION; DEPASSIVATION; ELECTRON SPIN RESONANCE; ELEVATED TEMPERATURE; FREE ELECTRON; HOLE CAPTURE; INTERFACE STATE; INVERSION LAYER; NEGATIVE BIAS TEMPERATURE INSTABILITY; ON THE FLIES; POSITIVELY CHARGED; PRE-STRESS; ROOM TEMPERATURE;

EID: 77957895909     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IRPS.2010.5488854     Document Type: Conference Paper
Times cited : (32)

References (34)
  • 1
    • 85014612976 scopus 로고    scopus 로고
    • Toward engineering modeling of negative bias temperature instability
    • D. M. Fleetwood, S. T. Pantelides, and R. D. Schrimpf, Eds. Boca Raton, London, New York: CRC Press
    • T. Grasser, W. Goes, and B. Kaczer, "Toward engineering modeling of negative bias temperature instability," in Defects in Microelectronic Materials and Devices, D. M. Fleetwood, S. T. Pantelides, and R. D. Schrimpf, Eds. Boca Raton, London, New York: CRC Press, 2009, pp. 399-436.
    • (2009) Defects in Microelectronic Materials and Devices , pp. 399-436
    • Grasser, T.1    Goes, W.2    Kaczer, B.3
  • 2
    • 84855922022 scopus 로고    scopus 로고
    • Negative bias temperature instabilities in pMOSFET devices
    • A. W. Strong, E. Y. Wu, R. P. Vollertsen, J. Sune, G. LaRosa, S. E. Rauch, and R. P. Sullivan, Eds. Hoboken: Wiley
    • G. LaRosa, "Negative bias temperature instabilities in pMOSFET devices," in Reliability Wearout Mechanisms in Advanced CMOS Technologies, A. W. Strong, E. Y. Wu, R. P. Vollertsen, J. Sune, G. LaRosa, S. E. Rauch, and R. P. Sullivan, Eds. Hoboken: Wiley, 2009, pp. 331-439.
    • (2009) Reliability Wearout Mechanisms in Advanced CMOS Technologies , pp. 331-439
    • LaRosa, G.1
  • 3
    • 34247891689 scopus 로고    scopus 로고
    • Negative bias temperature instability: What do we understand?
    • D. K. Schroder, "Negative bias temperature instability: What do we understand?," Microelectronics Reliability, pp. 841-852, 2007
    • (2007) Microelectronics Reliability , pp. 841-852
    • Schroder, D.K.1
  • 9
    • 84955268499 scopus 로고    scopus 로고
    • Behavior of NBTI under ac dynamic circuit conditions
    • W. Abadeer and W. Ellis, "Behavior of NBTI under ac dynamic circuit conditions," IEEE Int. Reliab. Phys. Symp., pp. 17-22, 2003
    • (2003) IEEE Int. Reliab. Phys. Symp. , pp. 17-22
    • Abadeer, W.1    Ellis, W.2
  • 15
    • 27744503541 scopus 로고    scopus 로고
    • Direct observation of the structure of defect centers involved in the negative bias temperature instability
    • J. P. Campbell, P. M. Lenahan, A. T. Krishnan, and S. Krishnan, "Direct observation of the structure of defect centers involved in the negative bias temperature instability," Applied Physics Letters, pp. 204106, 2005
    • (2005) Applied Physics Letters , pp. 204106
    • Campbell, J.P.1    Lenahan, P.M.2    Krishnan, A.T.3    Krishnan, S.4
  • 16
    • 0141457906 scopus 로고    scopus 로고
    • Atomic scale defects involved in MOS reliability problems
    • P. M. Lenahan, "Atomic scale defects involved in MOS reliability problems," Microelectronic Engineering, pp. 173-181, 2003
    • (2003) Microelectronic Engineering , pp. 173-181
    • Lenahan, P.M.1
  • 17
    • 34247897087 scopus 로고    scopus 로고
    • Deep level defects involved in MOS device instabilities
    • P. M. Lenahan, "Deep level defects involved in MOS device instabilities," Microelectronics Reliability, pp. 890-898, 2007
    • (2007) Microelectronics Reliability , pp. 890-898
    • Lenahan, P.M.1
  • 18
    • 0027853278 scopus 로고
    • Molecular-hydrogen, E' center hole traps, and radiation-induced interface traps in MOS devices
    • J. F. Conley and P. M. Lenahan, "Molecular-hydrogen, E' center hole traps, and radiation-induced interface traps in MOS devices," IEEE Transactions on Nuclear Science, pp. 1335-1340, 1993
    • (1993) IEEE Transactions on Nuclear Science , pp. 1335-1340
    • Conley, J.F.1    Lenahan, P.M.2
  • 20
    • 0029518434 scopus 로고
    • Electron spin resonance evidence that e'(gamma) centers can behave as switching oxide traps
    • J. F. Conley, P. M. Lenahan, A. J. Lelis, and T. R. Oldham, "Electron spin resonance evidence that e'(gamma) centers can behave as switching oxide traps," IEEE Transactions on Nuclear Science, pp. 1744-1749, 1995
    • (1995) IEEE Transactions on Nuclear Science , pp. 1744-1749
    • Conley, J.F.1    Lenahan, P.M.2    Lelis, A.J.3    Oldham, T.R.4
  • 31
    • 0017930413 scopus 로고
    • Explanation of large spin-dependent recombination effect in semiconductors
    • D. Kaplan, I. Solomon, and N. F. Mott, "Explanation of large spin-dependent recombination effect in semiconductors," Journal De Physique Lettres, pp. L51-L54, 1978
    • (1978) Journal de Physique Lettres
    • Kaplan, D.1    Solomon, I.2    Mott, N.F.3
  • 32
    • 0346539170 scopus 로고
    • Spin-dependent recombination on silicon surface
    • D. J. Lepine, "Spin-dependent recombination on silicon surface," Physical Review B, pp. 436-441, 1972
    • (1972) Physical Review B , pp. 436-441
    • Lepine, D.J.1
  • 34
    • 0021427238 scopus 로고
    • Hole traps and trivalent silicon centers in metal-oxide silicon devices
    • P. M. Lenahan and P. V. Dressendorfer, "Hole traps and trivalent silicon centers in metal-oxide silicon devices," Journal of Applied Physics, pp. 3495-3499, 1984
    • (1984) Journal of Applied Physics , pp. 3495-3499
    • Lenahan, P.M.1    Dressendorfer, P.V.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.