메뉴 건너뛰기




Volumn , Issue , 2010, Pages 1027-1033

Enhancement-mode gan MIS-HEMTs for power supplies

Author keywords

ALD; Enhancement mode; GaN; MIS HEMT

Indexed keywords

ALD; CAP STRUCTURE; CURRENT STATUS; DEVICE STRUCTURES; ENHANCEMENT-MODE; GAN; GAN HEMTS; HIGH BREAKDOWN VOLTAGE; HIGH CURRENT DENSITIES; HIGH-SPEED PERFORMANCE; MIS-HEMT; OFF MODE; ON-RESISTANCE; POWER SUPPLY;

EID: 77956540751     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IPEC.2010.5542039     Document Type: Conference Paper
Times cited : (44)

References (32)
  • 2
    • 47249146111 scopus 로고    scopus 로고
    • AlGaN/GaN recessed MIS-gate HFET with high-threshold-voltage normally-off operation for power electronics applications
    • T. Oka and T. Nozawa., "AlGaN/GaN Recessed MIS-Gate HFET with High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications," Electron Device Lett, VOL. 29, NO. 7(2008), pp. 668-670.
    • (2008) Electron Device Lett , vol.29 , Issue.7 , pp. 668-670
    • Oka, T.1    Nozawa, T.2
  • 4
    • 67349090180 scopus 로고    scopus 로고
    • Single-chip boost converter using monolithically integrated AlGaN/GaN lateral field-effect rectifier and normally off HEMT
    • W. Chen, K.-Y. Wong and K. J. Chen, "Single-Chip Boost Converter Using Monolithically Integrated AlGaN/GaN Lateral Field-Effect Rectifier and Normally Off HEMT," Electron Device Lett, Vol. 30, NO. 5 (2009), pp. 430-432.
    • (2009) Electron Device Lett , vol.30 , Issue.5 , pp. 430-432
    • Chen, W.1    Wong, K.-Y.2    Chen, K.J.3
  • 6
    • 34447256363 scopus 로고    scopus 로고
    • AlGaN/GaN HEMTs with thin InGaN cap layer for normally off operation
    • Jul.
    • T. Mzutani, M. Ito, S. Kishimoto, and F. Nakamura, "AlGaN/GaN HEMTs With Thin InGaN Cap Layer for Normally Off Operation," IEEE Electron Device Letters, vol. 28, no. 7, pp. 549-551, Jul. 2007.
    • (2007) IEEE Electron Device Letters , vol.28 , Issue.7 , pp. 549-551
    • Mzutani, T.1    Ito, M.2    Kishimoto, S.3    Nakamura, F.4
  • 11
    • 41549110751 scopus 로고    scopus 로고
    • Switching characteristics of GaN HFETs in a half bridge package for high temperature applications
    • T. Nomura, M. Masuda, N. Ikeda and S. Yoshida, "Switching Characteristics of GaN HFETs in a Half Bridge Package for High Temperature Applications," IEEE Trans. on Power Electronics, Vol. 23, No. 2, pp. 692-697, 2008
    • (2008) IEEE Trans. on Power Electronics , vol.23 , Issue.2 , pp. 692-697
    • Nomura, T.1    Masuda, M.2    Ikeda, N.3    Yoshida, S.4
  • 12
    • 34548410951 scopus 로고    scopus 로고
    • Evaluation of AlGaN/GaN heterostructure field-effect transistors on si substrate in power factor correction circuit
    • S. Iwakami, O. Machida, Y. Izawa, R. Baba, M. Yanagihara, T. Ehara, N. Kaneko, H. Goto and A. Iwabuchi, "Evaluation of AlGaN/GaN Heterostructure Field-Effect Transistors on Si Substrate in Power Factor Correction Circuit," Jpn. J. Appl. Phys., Vol. 46, No. 29, 2007, pp. L721-L723
    • (2007) Jpn. J. Appl. Phys. , vol.46 , Issue.29
    • Iwakami, S.1    Machida, O.2    Izawa, Y.3    Baba, R.4    Yanagihara, M.5    Ehara, T.6    Kaneko, N.7    Goto, H.8    Iwabuchi, A.9
  • 14
    • 77649179512 scopus 로고    scopus 로고
    • Enhancement-mode GaN MIS-HEMTs with n-GaN/i-AlN/n-GaN triple cap layer and high-k gate dielectrics
    • Mar.
    • M. Kanamura, T. Ohki, T. Kikkawa, K. Imanishi, T. Imada, A. Yamada and N. Hara, "Enhancement-Mode GaN MIS-HEMTs With n-GaN/i-AlN/n-GaN Triple Cap Layer and High-k Gate Dielectrics," IEEE Electron Device Letters, vol. 31, no. 3, pp. 189-191, Mar. 2010.
    • (2010) IEEE Electron Device Letters , vol.31 , Issue.3 , pp. 189-191
    • Kanamura, M.1    Ohki, T.2    Kikkawa, T.3    Imanishi, K.4    Imada, T.5    Yamada, A.6    Hara, N.7
  • 15
  • 17
    • 0035886086 scopus 로고    scopus 로고
    • Induced strain mechanism of current collapse in AlGaN/GaN heterostructure field-effect transistors
    • DOI 10.1063/1.1412282
    • G. Simin, A. Koudymov, A. Tarakji, X. Hu, J. Yang, M. Asif Khan, M. S. Shur, and R. Gaska, "Induced strain mechanism of current collapse in AlGaN/GaN heterostructure field-effect transistors," Appl. Phys. Lett., vol. 79, pp. 2651-2653, 2001. (Pubitemid 33599665)
    • (2001) Applied Physics Letters , vol.79 , Issue.16 , pp. 2651-2653
    • Simin, G.1    Koudymov, A.2    Tarakji, A.3    Hu, X.4    Yang, J.5    Asif Khan, M.6    Shur, M.S.7    Gaska, R.8
  • 18
    • 0028768736 scopus 로고
    • Current/voltage characteristic collapse in AlGaN/GaN heterostructure insulated gate field effect transistors at high drain bias
    • M. A. Khan, M. S. Shur, Q. C. Chen, and J. N. Kuznia, "Current/voltage characteristic collapse in AlGaN/GaN heterostructure insulated gate field effect transistors at high drain bias," Electron. Lett., vol. 30, pp. 2175-2176, 1994.
    • (1994) Electron. Lett. , vol.30 , pp. 2175-2176
    • Khan, M.A.1    Shur, M.S.2    Chen, Q.C.3    Kuznia, J.N.4
  • 20
    • 70449116483 scopus 로고    scopus 로고
    • Investigation on current collapse of AlGaN/GaN HFET by gate bias stress
    • Jin-Ping Ao, Yuya Yamaoka, Masaya Okada, Cheng-Yu Hu, and Yasuo Ohno, "Investigation on current collapse of AlGaN/GaN HFET by gate bias stress," IEICE Trans. Electron., vol. E91-C, pp. 1004-1008, 2008.
    • (2008) IEICE Trans. Electron. , vol.E91-C , pp. 1004-1008
    • Jin-Ping, A.O.1    Yamaoka, Y.2    Okada, M.3    Hu, C.-Y.4    Ohno, Y.5
  • 23
    • 38149014747 scopus 로고    scopus 로고
    • Gate injection transistor (GIT)-A normally-off AlGaN/GaN power transistor using conductivity modulation
    • Y. Uemoto et al., "Gate Injection Transistor (GIT)-A Normally-Off AlGaN/GaN Power Transistor Using Conductivity Modulation", IEEE Trans. Electron Devices, Vol. 54, No. 12, 3393, 2007
    • (2007) IEEE Trans. Electron Devices , vol.54 , Issue.12 , pp. 3393
    • Uemoto, Y.1
  • 25
    • 31744436913 scopus 로고    scopus 로고
    • Recessed gate structure approach toward normally off highvoltage AlGaN/GaN HEMT for power electronics applications
    • Feb.
    • W. Saito, Y. Takada, M. Kuraguchi, K. Tsuda, and I. Omura, "Recessed gate structure approach toward normally off highvoltage AlGaN/GaN HEMT for power electronics applications," IEEE Trans. Electron Devices, Vol. 53, No. 2, pp. 356-362, Feb. 2006
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.2 , pp. 356-362
    • Saito, W.1    Takada, Y.2    Kuraguchi, M.3    Tsuda, K.4    Omura, I.5
  • 26
    • 34547838038 scopus 로고    scopus 로고
    • Enhancement-mode AlGaN/AlN/GaN high electron mobility transistor with low on-state resistance and high breakdown voltage
    • Y. Ohmaki, M. Tanimoto, S. Akamatsu and T. Mukai, "Enhancement-Mode AlGaN/AlN/GaN High Electron Mobility Transistor with Low On-State Resistance and High Breakdown Voltage", Jpn. J. Appl. Phys., Vol. 45, No. 44 (2006)
    • (2006) Jpn. J. Appl. Phys. , vol.45 , Issue.44
    • Ohmaki, Y.1    Tanimoto, M.2    Akamatsu, S.3    Mukai, T.4
  • 28
    • 46049099192 scopus 로고    scopus 로고
    • High-breakdown enhancement-mode AlGaN/GaN HEMTs with integrated slant field-plate
    • Dec.
    • C. S. Suh, Y. Dora, N. Fichtenbaum, L. McCarthy, S. Keller, and U. K. Mishra, "High-breakdown enhancement-mode AlGaN/GaN HEMTs with integrated slant field-plate," in IEDM Tech. Dig., Dec. 2006, pp. 911-913.
    • (2006) IEDM Tech. Dig. , pp. 911-913
    • Suh, C.S.1    Dora, Y.2    Fichtenbaum, N.3    McCarthy, L.4    Keller, S.5    Mishra, U.K.6
  • 30
    • 64849106141 scopus 로고    scopus 로고
    • Highperformance E-mode AlGaN/GaN HEMTs with LT-gan cap layer using gate recess techniques
    • T. Adachi, T. Deguchi, A. Nakagawa, Y. Terada, and T. Egawa, "Highperformance E-mode AlGaN/GaN HEMTs with LT-GaN cap layer using gate recess techniques," in Proc. Device Res. Conf., 2008, pp. 129-130.
    • (2008) Proc. Device Res. Conf. , pp. 129-130
    • Adachi, T.1    Deguchi, T.2    Nakagawa, A.3    Terada, Y.4    Egawa, T.5
  • 31
    • 55149119392 scopus 로고    scopus 로고
    • V-gate GaN HEMTs with engineered buffer for normally off operation
    • Nov.
    • R. Chu, Z. Chen, S. P. DenBaars, and U. K. Mishra, "V-gate GaN HEMTs with engineered buffer for normally off operation," IEEE Electron Device Lett., vol. 29, no. 11, pp. 1184-1186, Nov. 2008.
    • (2008) IEEE Electron Device Lett. , vol.29 , Issue.11 , pp. 1184-1186
    • Chu, R.1    Chen, Z.2    DenBaars, S.P.3    Mishra, U.K.4
  • 32
    • 85008060433 scopus 로고    scopus 로고
    • Normally off AlGaN/GaN low-density drain HEMT (LDD-HEMT) with enhanced breakdown voltage and reduced current collapse
    • Mar.
    • D. Song, J. Liu, Z. Cheng, W. C. W. Tang, K. M. Lau, and K. J. Chen, "Normally off AlGaN/GaN low-density drain HEMT (LDD-HEMT) with enhanced breakdown voltage and reduced current collapse," IEEE Electron Device Lett., vol. 28, no. 3, pp. 189-191, Mar. 2007.
    • (2007) IEEE Electron Device Lett. , vol.28 , Issue.3 , pp. 189-191
    • Song, D.1    Liu, J.2    Cheng, Z.3    Tang, W.C.W.4    Lau, K.M.5    Chen, K.J.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.