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Volumn 29, Issue 11, 2008, Pages 1184-1186

V-Gate GaN HEMTs with engineered buffer for normally off operation

Author keywords

Buffer engineering; Enhancement mode; GaN; High electron mobility transistors (HEMTs); Normally off; V gate

Indexed keywords

ELECTRON MOBILITY; GALLIUM ALLOYS; GALLIUM NITRIDE; SEMICONDUCTING GALLIUM; TRANSISTORS;

EID: 55149119392     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2008.2004721     Document Type: Article
Times cited : (51)

References (11)
  • 7
    • 22944461728 scopus 로고    scopus 로고
    • High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment
    • Jul
    • Y. Cai, Y. Zhou, K. J. Chen, and K. M. Lau, "High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment," IEEE Electron Device Lett., vol. 26, no. 7, pp. 435-437, Jul. 2005.
    • (2005) IEEE Electron Device Lett , vol.26 , Issue.7 , pp. 435-437
    • Cai, Y.1    Zhou, Y.2    Chen, K.J.3    Lau, K.M.4
  • 10
    • 55149121059 scopus 로고    scopus 로고
    • M. Micovic, P. Hashimoto, M. Hu, I. Milosavljevic, J. Duvall, P. J. Willadsen, W. S. Wong, A. M. Conway, A. Kurdoghlian, P. W. Deelman, J. S. Moon, A. Schmitz, and M. J. Delaney, GaN double heterojunction field effect transistors for microwave and millimeterwave power applications, in IEDM Tech. Dig., Dec. 2004, pp. 33.4.1-33.4.4.
    • M. Micovic, P. Hashimoto, M. Hu, I. Milosavljevic, J. Duvall, P. J. Willadsen, W. S. Wong, A. M. Conway, A. Kurdoghlian, P. W. Deelman, J. S. Moon, A. Schmitz, and M. J. Delaney, "GaN double heterojunction field effect transistors for microwave and millimeterwave power applications," in IEDM Tech. Dig., Dec. 2004, pp. 33.4.1-33.4.4.
  • 11
    • 41749103778 scopus 로고    scopus 로고
    • Plasma treatment for leakage reduction in AlGaN/GaN and GaN Schottky diodes
    • Apr
    • R. M. Chu, L. K. Shen, N. Fichtenbaum, D. Brown, S. Keller, and U. K. Mishra, "Plasma treatment for leakage reduction in AlGaN/GaN and GaN Schottky diodes," IEEE Electron Device Lett., vol. 29, no. 4, pp. 297-299, Apr. 2008.
    • (2008) IEEE Electron Device Lett , vol.29 , Issue.4 , pp. 297-299
    • Chu, R.M.1    Shen, L.K.2    Fichtenbaum, N.3    Brown, D.4    Keller, S.5    Mishra, U.K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.