Nanoscale effects in carbon structures fabricated using focused ion beam-chemical vapor deposition

Thin Solid Films

Volumn 518, Issue 18, 2010, Pages 5177-5182

  Kim, Chung Soo ^a   Ahn, Sung Hoon ^b   Jang, Dong Young ^c  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

^c Seoul National University of Science and Technology   (South Korea)

Author keywords

Carbon; Focused ion beam chemical vapor deposition; Nanoscale effect; Phenanthrene gas; Scan area; Step size

Indexed keywords

ADSORBED GAS; CARBON DEPOSITES; CARBON STRUCTURES; DELOCALIZATIONS; DISCRETE STRUCTURE; NANOSCALE EFFECTS; NANOSCALE STRUCTURE; PHENANTHRENE GAS; RASTER SCANS; SCAN AREA; SHADOW EFFECTS; STEP SIZE;

ANTHRACENE; BEAM PLASMA INTERACTIONS; DEPOSITION; DEPOSITION RATES; FOCUSED ION BEAMS; ION BOMBARDMENT; IONS; NANOSTRUCTURED MATERIALS;

CHEMICAL VAPOR DEPOSITION;

EID: 77955655671     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.160     Document Type: Article

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