Characterization of focused ion beam induced deposition process and parameters calibration

Sensors and Actuators, A: Physical

Volumn 88, Issue 1, 2001, Pages 58-66

  Fu, Yongqi ^a   Bryan, Ngoi Kok Ann ^a   Shing, Ong Nan ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; FAILURE ANALYSIS; INTEGRATED CIRCUIT LAYOUT; ION BEAMS; MICROPROCESSOR CHIPS; SCANNING ELECTRON MICROSCOPY;

FOCUSED ION BEAM (FIB) DEPOSITION; INTEGRATED CIRCUIT CHIP MODIFICATION;

MICROSENSORS;

EID: 0035120995     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00490-8     Document Type: Article

References (8)

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