Nanometer scale patterning using focused ion beam milling

Review of Scientific Instruments

Volumn 76, Issue 2, 2005, Pages

  Petit, D ^a   Faulkner, C C ^a   Johnstone, S ^a   Wood, D ^a   Cowburn, R P ^a  

^a DURHAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMMINUTION; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; NANOTECHNOLOGY; OPTICAL SYSTEMS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; SENSORS; THIN FILMS;

CHROMATIC ABERRATION; FOCUSED ION BEAM (FIB) MILLING; GAUSSIAN DISTRIBUTION; HALL PROBE SENSORS;

ION BEAMS;

EID: 13744253779     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1844431     Document Type: Article

References (13)

1. U. Dötsch and A. D. Wieck, Nucl. Instrum. Methods Phys. Res. B 139, 12 (1998).
2. D. Litvinov and S. Khizroev, Nanotechnology 13, 179 (2002).
3. Gang Xiong, D. A. Allwood, M. D. Cooke, and R. P. Cowburn, Appl. Phys. Lett. 79, 3461 (2001).
4. L. Folks, M. E. Best, P. M. Rice, B. D. Terris, D. Weller, and J. N. Chapman, Appl. Phys. Lett. 76, 909 (2000).
5. D. Petit, D. Atkinson, S. Johnstone, D. Wood, and R. P. Cowburn, IEE Proc.: Sci., Meas. Technol. 151, 127 (2004).
6. J. Ziegler, J. P. Biersack, and U. Littmark, The Stopping of Ions in Matter (Pergamon, New York, 1985).
7. C. E. Sosolik, A. C. Lavery, E. B. Dahl, and B. H. Cooper, Rev. Sci. Instrum. 71, 3326 (2000).
8. A. Lugstein, B. Basnar, G. Hobler, and E. Bertagnolli, J. Appl. Phys. 92, 4037 (2002).
9. R. L. Kubena and J. W. Ward, Appl. Phys. Lett. 51, 1960 (1987).
10. M. Komuro, T. Kanayama, H. Hiroshima, and H. Tanoue, Appl. Phys. Lett. 42, 908 (1983).
11. J. Orloff, Rev. Sci. Instrum. 64, 1105 (1993).
12. P. Marriott, Appl. Phys. A: Solids Surf. A44, 329 (1987).
13. D. M. Longo, W. E. Benson, T. Chraska, and R. Hull, Appl. Phys. Lett. 78, 981 (2001).