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Volumn 96, Issue 26, 2010, Pages

Drain current modulation in a nanoscale field-effect-transistor channel by single dopant implantation

Author keywords

[No Author keywords available]

Indexed keywords

DEGREES OF FREEDOM; DOPANT IMPLANTATION; DOPANT NUMBERS; ELECTRONIC STOPPING; FIELD-EFFECT; ION IRRADIATION; ION STOPPING; NANO SCALE; NANOSCALE DEVICE; NANOSCALE METALS; NUCLEAR STOPPING; SINGLE ATOMS; TRANSISTOR CHANNELS;

EID: 77954341803     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3458783     Document Type: Article
Times cited : (30)

References (30)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.