Ion implantation with scanning probe alignment

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2798-2800

  Persaud, A ^a   Liddle, J A ^a   Schenkel, T ^a   Bokor, J ^a,b   Ivanov, Tzv ^c   Rangelow, I W ^c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

APERTURES; ION BEAM SPOT SIZE; RESISTS; SCANNING PROBE ALIGNMENT;

ALIGNMENT; IMAGING TECHNIQUES; ION BEAMS; PROBES; SCANNING; VACUUM;

ION IMPLANTATION;

EID: 29044450728     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2062628     Document Type: Article

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