Development status of projection optics and illumination optics for EUV1

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Murakami, Katsuhiko ^a   Oshino, Tetsuya ^a   Kondo, Hiroyuki ^a   Chiba, Hiroshi ^a   Komatsuda, Hideki ^a   Nomura, Kazushi ^a   Iwata, Hiromitsu ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Aspheric mirrors; EUVL; Illumination optics; Multilayer coatings; Projection optics

Indexed keywords

ASPHERIC MIRRORS; EUV RADIATION; EXPOSURE TOOL; HIGH NA; ILLUMINATION OPTICS; IRRADIATION UNIFORMITY; MULTILAYER COATINGS; POLISHING PROCESSS; POWER SPECTRUM DENSITY; PROJECTION OPTICS; PUPIL FILL; SPECTRAL PURITY; TEST STANDS; VISIBLE LIGHT; WAVEFRONT ERRORS;

EXTREME ULTRAVIOLET LITHOGRAPHY; MIRRORS; WAVEFRONTS;

OPTICS;

EID: 56249102314     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772435     Document Type: Conference Paper

References (5)

1. T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Morita, K. Hada and Y. Ohkubo, "Nikon EUVL development progress update", this proceedings, [6921-22].
2. T. Oshino, S. Takahashi, T. Yamamoto, T. Miyoshi, M. Shiraishi, T. Komiya, N. Kandaka, H. Kondo, K. Mashima, K. Nomura, K. Murakami, T. Okuyama, H. Oizumi, I. Nishiyama and S. Okazaki, "Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)", J. Vac. Sci. Technol. B 22 (6), pp. 2975-2979, 2004. (Pubitemid 40185052)
3. K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe, "EUV wavefront measurement of six-mirror optics using EWMS", this proceedings, [6921-106].
4. K. Murakami, T. Oshino, H. Kondo, H. Chiba, H. Komatsuda, K. Nomura and H. Iwata, "Development of optics for EUV lithography tools", Proc. SPIE, [6517-18], 2007.
5. H. Komatsuda, "Novel illumination system for EUVL", Proc. SPIE, 3997, pp. 765-776, 2000.