The application of EUV lithography for 40nm node DRAM devices and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Park, Joo On ^a   Koh, Chawon ^a   Goo, Doohoon ^a   Kim, InSung ^a   Park, Changmin ^a   Lee, Jeonghoon ^a   Park, JinHong ^a   Yeo, JeongHo ^a   Choi, Seong Woon ^a   Park, Chan Hoon ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

ADT(alpha demo tool); CD(critical dimension); Extreme ultraviolet lithography; MMO; Shadowing effect

Indexed keywords

ADT(ALPHA-DEMO TOOL); ARF LITHOGRAPHY; CD(CRITICAL DIMENSION); CONTACT LAYERS; CRITICAL DIMENSION; DEVICE APPLICATION; DEVICE INTEGRATION; DRAM DEVICES; ELECTRICAL CHARACTERISTIC; EUV LITHOGRAPHY; FULL-FIELD; LOW THERMAL EXPANSION MATERIALS; MMO; NEXT GENERATION LITHOGRAPHY; PROCESS INTEGRATION; PROCESS WINDOW; RESOLUTION LIMITS; SHADOWING EFFECT;

DATA STORAGE EQUIPMENT; LASER PULSES; LITHOGRAPHY; NANOTECHNOLOGY; THERMAL EXPANSION; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149099837     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814001     Document Type: Conference Paper

References (10)

1. B. La Fontaine, et al., "The use of EUV lithography to produce demonstration devices", Proc. SPIE, Vol. 6921(2008).
2. G.F Lorusso, et al., "Imaging performance of the EUV alpha demo tool at IMEC", Proc. SPIE, Vol. 6921(2008).
3. E. Hendrickx, et al., "Full field EUV lithography: lessons learned on EUV ADT imaging, EUV resist and EUV reticles". Proc. SPIE, Vol. 7140(2008)
4. Hans Meiling, et al., "Performance of the full field EUV systems", Proc. SPIE, Vol. 6921(2008).
5. Rik Jonckheere, et al., "Full field EUV lithography turning into a reality at IMEC", Proc. SPIE, Vol. 6607, (2007).
6. Hoyoung Kang, et al., "EUV simulation extension study for mask shadowing effect and its correction", Proc. SPIE, Vol. 6921(2008).
7. Takashi Kamo, et al., "Impact of mask absorber properties on printability in EUV lithography", Proc. SPIE, Vol. 6730(2007);
8. J. P. Kirk, "Scattered Light in Photolithographic Lenses", Optical/Laser Microlithography VII, Proc., SPIE Vol. 2197 (1994) pp. 566-572.
9. Insung Kim, et al., "Methodology of Flare Modeling and Compensation in EUVL', Proc. SPIE, Vol. 7140(2008).
10. Jeonghoon Lee, et al., "Assessment of Full Chip Level EUV Optical Correction for Sub 40nm Memory Device", this conference(2009).