Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3345-3350

  Lu, Bing ^a   Taylor, James W ^a   Cerrina, Franco ^a   Soo, Choi Pheng ^b   Bourdillon, Antony J ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033271731     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591009     Document Type: Article

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