LPP source system development for HVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Brandt, David C ^a   Fomenkov, Igor V ^a   Ershov, Alex I ^a   Partlo, William N ^a   Myers, David W ^a   Böwering, Norbert R ^a   Farrar, Nigel R ^a   Vaschenko, Georgiy O ^a   Khodykin, Oleh V ^a   Bykanov, Alexander N ^a   Hoffman, Jerzy R ^a   Chrobak, Christopher P ^a   Srivastava, Shailendra N ^a   Ahmad, Imtiaz ^a   Rajyaguru, Chirag ^a   Golich, Daniel J ^a   Vidusek, David A ^a   De Dea, Silvia ^a   Hou, Richard R ^a  

^a CYMER INC   (United States)

Author keywords

EUV lithography; EUV source; Laser produced plasma; Normal incidence collector

Indexed keywords

CIRCUIT FEATURES; COLLECTOR OPTICS; CRITICAL PARAMETER; DEBRIS MITIGATION; DROPLET GENERATORS; DROPLET SIZES; EUV LITHOGRAPHY; EUV SOURCE; EXTREME ULTRAVIOLET; INCIDENT PARTICLES; LPP SOURCES; MIRROR COATING; MULTI-LAYER-COATING; NORMAL INCIDENCE COLLECTOR; OPTICAL IMAGING; PRODUCTION SYSTEM; ROADMAP; SCANNER MANUFACTURERS; TARGET MATERIALS; ULTRA-VIOLET;

DEBRIS; DROP FORMATION; DUST COLLECTORS; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LASERS; LIGHT; LIGHTING; MIRRORS; PLASMA DIAGNOSTICS; REFLECTION; REPORT GENERATORS; SCANNING; TECHNOLOGICAL FORECASTING; TIN;

ULTRAVIOLET DEVICES;

EID: 67149111632     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814228     Document Type: Conference Paper

References (12)

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