Prevention of optics and resist contamination in 300mm lithography - Improvements in chemical air filtration

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 739-752

  Kinkead, D A ^a   Grayfer, A ^a   Kishkovich, O ^a  

^a Extraction Systems Inc   (United States)

Author keywords

Amines; CD control; Chemically amplified photoresist delay stability; Optic clouding; Optics hazing; Organic contamination; Photo induced organic contamination; Photoresist contamination; T topping

Indexed keywords

AIR FILTERS; CONTAMINATION; OPTICS; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION;

PHOTORESIST CONTAMINATION;

PHOTORESISTS;

EID: 0034758430     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436802     Document Type: Conference Paper

References (0)