Recent progress of EUV full field exposure tool in selete

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Tawarayama, Kazuo ^a   Aoyama, Hajime ^a   Magoshi, Shunko ^a   Tanaka, Yuusuke ^a   Shirai, Seiichiro ^a   Tanaka, Hiroyuki ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUVL; Extreme ultraviolet lithography; Overlay; Resist printing

Indexed keywords

CD UNIFORMITY; DYNAMIC EXPOSURE; EUVL; EXPOSURE TOOL; FULL FIELD EXPOSURE TOOLS; FULL-FIELD; GLOBAL ALIGNMENT; LITHOGRAPHY TOOLS; OVERLAY; OVERLAY ACCURACY; RECENT PROGRESS; RESIST PRINTING; TEST SITE;

ALIGNMENT; EXPOSURE METERS; LASER PULSES; PRINTING; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149142169     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813627     Document Type: Conference Paper

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