Stability and imaging of the ASML EUV alpha demo tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Hermans, Jan V ^a   Baudemprez, Bart ^a   Lorusso, Gian ^a   Hendrickx, Eric ^a   Van Dijk, Andre ^b   Jonckheere, Rik ^a   Goethals, Anne Marie ^a  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

Author keywords

CD uniformity; EUV; Full field; Monitoring; Overlay; Resist; Reticle; Scanner; Stability

Indexed keywords

CD UNIFORMITY; EUV; FULL-FIELD; OVERLAY; RESIST; RETICLE; SCANNER;

DATA STORAGE EQUIPMENT; EDUCATION; MASKS; OPTICAL INSTRUMENTS; SCANNING; SILICON WAFERS; STABILITY;

ULTRAVIOLET DEVICES;

EID: 67149119592     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814484     Document Type: Conference Paper

References (5)

1. E. Hendrickx et al, "Full field EUV lithography: Lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles", Proc. SPIE Asia 7140 (2008)
2. 2 FinFET 6T-SRAM cell", Technical Digest International Electron Devices Meeting - IEDM, pp.861-864 (2008)
3. th International Symposium on Extreme Ultraviolet Lithography, September 29-October 1, Lake Tahoe, USA (2008)
4. G. F. Lorusso et al, "Imaging performance of the EUV alpha demo tool at IMEC", Proc. SPIE 6921 (2008)
5. H. Meiling et al, "Performance of the Full Field EUV Systems", Proc. SPIE 6921 (2008)