Electron beam mask writer EBM-7000 for hp 32nm generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Kamikubo, Takashi ^a   Ohtoshi, Kenji ^a   Nakayamada, Noriaki ^a   Nishimura, Rieko ^a   Sunaoshi, Hitoshi ^a   Akeno, Kiminobu ^b   Mitsui, Soichiro ^b   Tachikawa, Yuichi ^a   Inoue, Hideo ^a   Oogi, Susumu ^a   Higurashi, Hitoshi ^a   Mine, Akinori ^a   Ishimura, Takiji ^a   Tsuchiya, Seiichi ^a   Gomi, Yoshitada ^a   Matsui, Hideki ^a   Tamamushi, Shuichi ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Beam blur; Data volume; Electron beam mask writer; Image placement; Local CD uniformity; Overlay; Resolution; Shot count

Indexed keywords

BEAM BLUR; CD UNIFORMITY; DATA VOLUME; IMAGE PLACEMENTS; OVERLAY; SHOT COUNT;

DATA HANDLING; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; OPTICAL SYSTEMS;

PHOTOMASKS;

EID: 77953314483     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.833462     Document Type: Conference Paper

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