EBM-5000 : Electron beam mask writer for 45 nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Sunaoshi, Hitoshi ^a   Tachikawa, Yuichi ^a   Higurashi, Hitoshi ^a   Iijima, Tomohiro ^a   Suzuki, Junichi ^a   Kamikubo, Takashi ^a   Ohtoshi, Kenji ^a   Anze, Hirohito ^a   Katsumata, Takehiko ^a   Nakayamada, Noriaki ^a   Hara, Shigehiro ^a   Tamamushi, Shuichi ^a   Ogawa, Yoji ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

CD uniformity; Electron beam mask writer; High current density; Shot noise; Throughput; VSB

Indexed keywords

CURRENT DENSITY; DATA HANDLING; ELECTRON BEAMS; ELECTRON OPTICS; SHOT NOISE; THROUGHPUT;

CD UNIFORMITY; ELECTRON BEAM MASK WRITER; HIGH CURRENT DENSITY; VARIABLE SHAPED ELECTRON BEAM (VSB);

MASKS;

EID: 33748059881     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681732     Document Type: Conference Paper

References (9)

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