Exploring the fundamental limit of CD control: Shot noise and CD uniformity improvement through resist thickness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 42-51

  Yu, Ming L ^a   Sagle, Allan ^a   Buller, Benny ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

Acid diffusion; Beam blur; CD uniformity; Resist; Shot noise

Indexed keywords

ELECTRIC RESISTANCE; ELECTRON BEAM LITHOGRAPHY; MOLECULAR DYNAMICS; SHOT NOISE; THICKNESS CONTROL;

ACID DIFFUSION; BEAM BLUR; CD UNIFORMITY; RESIST;

MASKS;

EID: 28544436853     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617058     Document Type: Conference Paper

References (21)

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