A study of EB pattern writer system design for 22nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Tamamushi, Shuichi ^a   Hamada, Hideaki ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

DFM; Electron beam mask writer; OPC; Shot count; Throughput; VSB

Indexed keywords

DATA STRUCTURES; ELECTRON BEAMS; MICROPROCESSOR CHIPS; SYSTEMS ANALYSIS;

ELECTRON BEAM MASK WRITERS; PATTERN WRITER SYSTEMS; RESOLUTION ENHANCEMENT; SHOT COUNTS;

PHOTOLITHOGRAPHY;

EID: 36249000543     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728985     Document Type: Conference Paper

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