Global critical dimension correction: II

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 6 A, 2007, Pages 3368-3376

  Abe, Takayuki ^a   Suzuki, Jun Ichi ^a   Yashima, Jun ^a   Iijima, Tomohiro ^a   Tsurumaki, Hideyuki ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

CD; CMP; Correction; Effect; Electron beam; Flare; Global; Lithography; Loading; LSI; Mask; Process; Proximity; Semiconductor

Indexed keywords

ELECTRON BEAMS; ERROR ANALYSIS; ERROR CORRECTION; LITHOGRAPHY; NUMERICAL METHODS; WSI CIRCUITS;

CRITICAL DIMENSION (CD); FLARE; PROXIMITY;

LSI CIRCUITS;

EID: 34547838243     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3368     Document Type: Article

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