Using metrology capabilities of mask inspection equipment for optimizing total lithography performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Tamamushi, Shuichi ^a   Takamatsu, Noriyuki ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

CD uniformity; DPT; Image placement; Mask inspection

Indexed keywords

CD UNIFORMITY; DPT; IMAGE DATA; IMAGE PLACEMENTS; IN-DIE OVERLAY; INSPECTION SYSTEM; MASK INSPECTION; MASK PATTERNS; MEASUREMENT FUNCTION;

INSPECTION EQUIPMENT; OPTIMIZATION; PHOTOMASKS; SCANNING; TITRATION;

INSPECTION;

EID: 79959348637     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.833513     Document Type: Conference Paper

References (8)

1. Nakayamada, N., et al., "Modeling of charging effect and its correction by EB mask writer EBM-6000", Proc. SPIE vol. 7028, 70280C (2008).
2. Sagiv, A., et al., "IntenCD™: Mask Critical Dimension Variation Mapping", Proc. SPIE vol. 7028, 70282X (2008).
3. Kim, H., et al., "IntenCD™: an application for CD Uniformity mapping of photomask and process control at maskshop", Proc. SPIE vol. 7028, 70281K (2008).
4. Vellanki, V., et al., "Reticle Inspection-Based Critical Dimension Uniformity", Proc. SPIE vol. 7379, 73791D (2009).
5. Shigemitsu, F., "Smart Way to Determine and Guarantee Mask Specifications-Trade-off between Cost and Quality-", Proc. SPIE vol. 7379, 73790T (2009)
6. Kikuiri, N., et al., "Development of Advanced Reticle Inspection Apparatus for hp 65 nm node device and beyond", Proc. SPIE vol. 6283, 62830Y (2006).
7. Tsuji, Y., et al., "Development of next generation mask inspection method by using the feature of mask image captured with 199nm inspection optics", Proc. SPIE vol. 6349, 63493M (2006).
8. Hirano, R., et al., "Development of Advanced mask inspection optics with transmitted and reflected light image acquisition", Proc. SPIE vol. 6518, 65181U (2007).