Reduction of resist charging effect by EB reticle writer EBM-7000

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Saito, Masato ^a   Ugajin, Kunihiro ^a   Ikenaga, Osamu ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 69949166525     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824287     Document Type: Conference Paper

References (1)

1. Nakayamada et al., "Modeling of charging effect and its correction by EB mask writer", Proc. of SPIE Vol.7028 Proc. Of