New electron optics for mask writer ebm-7000 to challenge hp 32nm generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Kamikubo, Takashi ^a   Golladay, Steven ^a,b   Kendall, Rodney ^a,b   Katsap, Victor ^a,b   Ohtoshi, Kenji ^a   Ogasawara, Munehiro ^a,c   Nishimura, Shinsuke ^a,c   Nishimura, Rieko ^a   Iizuka, Osamu ^a   Nakayama, Takahito ^a   Shinkawa, Shunji ^a   Nishiyama, Tetsurou ^a   Tamamushi, Shuichi ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

^b NuFlare Technology   (United States)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

Acid diffusion; Chemically amplified resist; Electron beam mask writer; Process blur; Resolution

Indexed keywords

ACID DIFFUSION; BEAM BLURS; BEAM INTENSITIES; BEAM RESOLUTIONS; CHEMICALLY AMPLIFIED RESIST; COST EFFECTIVES; DATA VOLUMES; DEVELOPMENT PROCESS; DOSE MARGINS; ELECTRON-OPTICAL COLUMNS; IN-SITU; MINIMUM FEATURE SIZES; PROCESS BLUR; PROCESS IMPROVEMENTS; RESOLUTION; SEMICONDUCTOR SCALING; SIMPLE MODELS;

ACIDS; ELECTRON BEAMS; ELECTRONS; PHOTORESISTORS; PHOTORESISTS;

MASKS;

EID: 62649169059     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801725     Document Type: Conference Paper

References (7)

1. International technology roadmap for semiconductors (ITRS) 2007, http://www.itrs.net/
2. Jun. Yashima et al, Proc. of SPIE Vol. 6607, 660703-1 (2007)
3. Wen-Hao Cheng and Jeff Farnsworth, Proc. Of SPIE Vol. 6607, 660724 (2007)
4. Shanghee Lee et al, Proc. Of SPIE Vol. 6349, 63490X (2006)
5. J. S. Greeneich, J. Vac. Sci. Technol., 16(6), 1749 (1979)
6. Takashi Kamikubo et al, Proceedings of the Seventh International Conference of Charged Particle Optics 2006, Physics procedia (2008) (to be published)
7. Hitoshi Sunaoshi et al, Proc. Of SPIE Vol. 6792, 679208 (2008)