Modeling of charging effect and its correction by EB mask writer EBM-6000

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Nakayamada, Noriaki ^a   Wake, Seiji ^a   Kamikubo, Takashi ^a   Sunaoshi, Hitoshi ^a   Tamamushi, Shuichi ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

Double patterning; Electron beam mask writer; Overlay accuracy; Pattern placement accuracy; Surface charging effect

Indexed keywords

COMPUTER NETWORKS; HOLOGRAMS; MASKS; TECHNOLOGY;

BEAM POSITIONING; CHARGING BEHAVIOR; CHARGING EFFECTS; ERROR SOURCES; MASK TECHNOLOGY; MASK WRITER; NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING; PLACEMENT ACCURACY;

PHOTOACOUSTIC EFFECT;

EID: 45749101683     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793020     Document Type: Conference Paper

References (11)

1. M. Miyazaki, N. Saito, and C. Munakata, "Deflection errors due to sample potential in electron beam lithography machine", J. Phys. E: Sci. Instrum., Vol. 14, 194-195 (1981)
2. M. A. Sturans, J. G. Smolinski, and J. A. Robinson, "Positional errors due to substrate charging in e-beam lithography tools", SPIE Vol. 1604, 36-44 (1991)
3. A. Melchinger and S. Hofmann, "Dynamic double layer model: Description of time dependent charging phenomena in insulators under electron beam irradiation", J. Appl. Phys. Vol. 78, No. 10, 6224-6232 (1995)
4. Y. U. Ko, J. J. Hwu, and D. C. Joy, "Monte Carlo model of charging in resists in e-beam lithography", SPIE Vol. 3998, 694-702 (2000)
5. Y. Lee, W. Lee, and K. Chun, "Calculation of surface potential and beam deflection due to charging effects in electron beam lithography", J. Vac. Sci. Technol. B18(6), 3095-3098 (2000)
6. M. Kotera, "Simulation of time-dependent charging of resist on Si under electron-beam irradiation", J. Vac. Sci. Technol. B 19(6), 2516-2519 (2001)
7. W. Liu, J. Ingino, and R. F. Pease, "Resist charging in electron beam lithography", J. Vac. Sei. Technol. B13, 1979-1983 (1995)
8. M. Bai, R.F.W. Pease, C. Tanasa, M. A. McCord, D. S. Pickard, and D. Meisburger, "Charging and discharging of electron beam resist films", J. Vac. Sci. Technol. B17(6), 2893-2896 (1999)
9. B. Alles, E. Cotte, B. Simeon, and T. Wandel, "Modeling the work piece charging during e-beam lithography", SPIE Advanced Lithography 6924-182 (2008)
10. N. Shimomura, M. Ogasawara, J. Takamatsu, S. Yoshitake, K. Ooki, N. Nakayamada, F. Okabe, and T. Tojo, "Reduction of fogging effect caused by scattered electrons in an electron beam system", SPIE Vol. 3748, 408-415 (1999)
11. M. Bai and F. Pease, "Electron beam induced conductivity in polymethyl methacrylate, polyamide, and SiO2 thin films", J. Vac. Sci. Technol. B22(6), 2907-2911 (2004)