Electron-beam mask writer EBM-6000 for 45 nm HP node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Yashima, Jun ^a   Ohtoshi, Kenji ^a   Nakayamada, Noriaki ^a   Anze, Hirohito ^a   Katsumata, Takehiko ^a   Iijima, Tomohiro ^a   Nishimura, Rieko ^a   Fukutome, Syuuichiro ^a   Miyamoto, Nobuo ^a   Wake, Seiji ^a   Sakai, Yusuke ^a   Sakamoto, Shinji ^a   Hara, Shigehiro ^a   Higurashi, Hitoshi ^a   Hattori, Kiyoshi ^a   Saito, Kenichi ^a   Kendall, Rodney ^a   Tamamushi, Shuichi ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

CAR resist; CD uniformity; Electron beam mask writer; Shot count; Throughput

Indexed keywords

CATHODES; CURRENT DENSITY; DATA HANDLING; SPEECH INTELLIGIBILITY;

CAR RESIST; CD UNIFORMITY; ELECTRON BEAM MASK WRITER; SHOT COUNT;

ELECTRON BEAMS;

EID: 36248961036     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728917     Document Type: Conference Paper

References (7)

1. T.Tojo et al, "Advanced electron-beam writing system EX-11 for next-generation mask fabrication", Proceedings of SPIE, vol.3748, pp416-425, (1999).
2. N.Nakayamada et al., "Variable stage speed writing for EBM-4500", Digest of papers Photomask Japan, pp171-172, (2005).
3. Y.Hattori et al., "Solution for 100 nm: EBM-4000", Proceedings of SPIE, Vol.4754, pp.696-703, (2002)
4. N.Shimomura et al., "Eddy current evaluation for a high-re solution EB system", Proceedings of SPIE, Vol.4186, p.460-467, (2001).
5. H.Sunaoshi et al., "EBM-5000:Electron beam mask writer for 45 nm node", Proceedings of SPIE, Vol. 6283, 628306, (2006)
6. "INTERNATIONALTECHNOLOGY ROADMAP FOR SEMICONDUCTORS, 2006 UPDATE", 2006
7. M.LYu, A.Sagel and B.Buller, "Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness", Proceedings of SPIE, Vol.5853, pp.43-51, (2005)