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Volumn 46, Issue 6 A, 2007, Pages 3359-3367
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Global critical dimension correction: I. fogging effect correction
a a a a a a a a a a |
Author keywords
Correction, mask; Effect; Electron beam; Fogging; Foggy; LSI; Proximity; Semiconductor
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Indexed keywords
COMPUTATION THEORY;
ERROR CORRECTION;
PARAMETER ESTIMATION;
FOGGING;
PROXIMITY;
ELECTRON BEAMS;
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EID: 34547828861
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.46.3359 Document Type: Article |
Times cited : (14)
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References (15)
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