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Volumn 46, Issue 6 A, 2007, Pages 3359-3367

Global critical dimension correction: I. fogging effect correction

Author keywords

Correction, mask; Effect; Electron beam; Fogging; Foggy; LSI; Proximity; Semiconductor

Indexed keywords

COMPUTATION THEORY; ERROR CORRECTION; PARAMETER ESTIMATION;

EID: 34547828861     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3359     Document Type: Article
Times cited : (14)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.