Inverse Lithography Technology (ILT), What is the impact to photomask industry?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Pang, Linyong ^a   Liu, Yong ^a   Abrams, Dan ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

Lithography Technology (ILT); Mask inspection; Mask writing; OPC; RET

Indexed keywords

COMPUTER SIMULATION; DATA ACQUISITION; IMAGE ANALYSIS; MASKS; SILICON WAFERS;

LITHOGRAPHY TECHNOLOGY (ILT); MASK INSPECTION; MASK WRITING; RET;

LITHOGRAPHY;

EID: 33748039112     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681857     Document Type: Conference Paper

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