Pixelated phase mask as novel lithography RET

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Borodovsky, Yan ^a   Cheng, Wen Hao ^a   Schenker, Richard ^a   Singh, Vivek ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Computational lithography; ILT; Phase shift mask; PSM; Thick mask; Variable phase transmission PSM

Indexed keywords

(PL) PROPERTIES; 65-NM NODES; LATERAL DIMENSIONS; OPTICAL MICRO LITHOGRAPHY; PHASE MASKS; PIXEL DIMENSIONS; RADIATION SCATTERING; RADIATION WAVE LENGTH; RESOLUTION ENHANCEMENT TECHNIQUE (RET); VARIABLE PHASE; WAFER PATTERNING;

LITHOGRAPHY; PIXELS; PULSE MODULATION; PULSE POSITION MODULATION; RADIATION;

IMAGING TECHNIQUES;

EID: 45449092775     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772116     Document Type: Conference Paper

References (6)

1. Schenker, Richard et al., "Integration of Pixelated Phase Masks for full chip random logic layers", Proc. SPIE Vol. 6924, 2008
2. Singh, Vivek et al., "Making a trillion pixels dance", Proc. SPIE Vol. 6924, 2008
3. Farnsworth, Jeff et al., "Fabrication of defect free full-field pixelated phase mask", Proc. SPIE Vol. 6924, 2008
4. Davids, Paul et al., "Generalized inverse problem for partially coherent projection Lithography" Proc. SPIE Vol. 6924, 2008
5. Poonawala, Amyn et al., "A pixel-based quantization approach to inverse lithography", Microelectronic Engineering, Volume 84, Issue 12, December 2007, Pages 2837-2852
6. Poonawala, Amyn et al., "ILT for double exposure lithography with conventional and novel materials" Proc. SPIE Vol. 6520, 2007