Variable shaped beam writing throughput at the 45nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Sowers, A ^a   Shumway, M ^a   Kamna, M ^a   Wilcox, N ^a   Vernon, M ^a   Cole, D ^a   Chandramouli, M ^a  

^a INTEL CORPORATION   (United States)

Author keywords

50keV; E beam throughput; Variable shaped beam

Indexed keywords

E-BEAM THROUGHPUT; FIGURE COUNT EXPLOSION; MOORE'S LAW; VARIABLE SHAPED BEAMS;

ALGORITHMS; CURRENT DENSITY; MATHEMATICAL MODELS; OPTICAL VARIABLES CONTROL; PHOTOLITHOGRAPHY; THROUGHPUT;

LIGHT EMISSION;

EID: 33846579189     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686566     Document Type: Conference Paper

References (6)

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