Mask image position correction for double patterning lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Saito, Masato ^a   Itoh, Masamitsu ^a   Ikenaga, Osamu ^a   Ishigo, Kazutaka ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Bending; Chuck; Correction; Distortion; Flatness; Image placement accuracy

Indexed keywords

BAR CODES; COMPUTER NETWORKS; DATA TRANSFER; FORECASTING; HOLOGRAMS; LITHOGRAPHY; STAGES; TECHNOLOGY; TWO DIMENSIONAL;

BAR CODING; CORRECTION SYSTEM; DEVICE GENERATION; DISTORTION (DEFORMATION); DOUBLE PATTERNING; EXPOSURE TOOLS; IMAGE POSITION; MASK FLATNESS; MASK TECHNOLOGY; NEXT-GENERATION LITHOGRAPHY (NGL); PATTERN POSITION; PHOTO MASKING; POSITION ACCURACY; SERIAL NUMBER; SURFACE SHAPES; TRANSFER SYSTEMS; VACUUM CHUCKING;

PHOTOMASKS;

EID: 45549094012     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793021     Document Type: Conference Paper

References (1)

1. M.Itoh et al., "New Concept of Specification for Mask Flatness", Proc. of SPIE Vol.4754