Modelling of diamond deposition microwave cavity generated plasmas

Journal of Physics D: Applied Physics

Volumn 43, Issue 15, 2010, Pages

  Hassouni, K ^a   Silva, F ^a   Gicquel, A ^a  

^a UNIVERSITÉ PARIS 13   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CAVITY STRUCTURE; CHEMICAL PROCESS; DEPOSITION CONDITIONS; DEPOSITION PROCESS; DIAMOND DEPOSITION; DIAMOND GROWTH; HYDROGEN PLASMAS; MICROWAVE CAVITY; MODEL PREDICTION; MODERATE PRESSURES; NUMERICAL MODELLING; PLASMA AXIS; PLASMA COMPOSITION; PLASMA CONFIGURATION; POWER DEPOSITION; PULSE WAVEFORMS; PULSED MODE; QUALITY ENHANCEMENT; SELF-CONSISTENT SIMULATIONS; SPECIES DENSITY; STABLE PROCESS; SUBSTRATE SURFACE; TIME VARIATIONS; TRANSPORT MODELS; TRANSPORT PHENOMENA;

DEPOSITION; DIAMOND DEPOSITS; DIAMONDS; MICROWAVES; OPTIMIZATION; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; STABILITY CRITERIA;

ELECTRIC DISCHARGES;

EID: 77950591924     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/15/153001     Document Type: Review

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