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Volumn 21, Issue 36, 2009, Pages
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Microwave engineering of plasma-assisted CVD reactors for diamond deposition
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC HYDROGEN;
CHEMICAL VAPOUR DEPOSITION;
COUPLING EFFICIENCY;
COUPLING SYSTEMS;
CVD DIAMOND;
CVD REACTORS;
DIAMOND DEPOSITION;
ELECTROMAGNETIC SIMULATION;
FILM PURITY;
HIGH DENSITY PLASMAS;
HIGH ELECTRIC FIELDS;
HIGH MICROWAVE;
HIGH POWER DENSITY;
HIGH POWER ELECTRONICS;
HIGH PURITY;
HOMOGENEOUS FILMS;
INDUSTRIAL USE;
INPUT POWER;
LOWER FREQUENCIES;
MICROWAVE ENGINEERING;
MICROWAVE PLASMA;
MODELLING TOOLS;
OPERATING PRINCIPLES;
PLASMA LOADS;
PLASMA REACTORS;
RAPID GROWTH;
REACTOR DESIGNS;
REACTOR WALLS;
RESONANT CAVITY;
SCALING-UP;
DIAMOND DEPOSITS;
DIAMOND FILMS;
DIAMONDS;
ELECTRIC FIELDS;
FILM GROWTH;
HEATING;
HYDROGEN;
INDUSTRIAL APPLICATIONS;
MICROWAVES;
PLASMA DEPOSITION;
PLASMAS;
POWER ELECTRONICS;
CHEMICAL VAPOR DEPOSITION;
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EID: 70349599592
PISSN: 09538984
EISSN: 1361648X
Source Type: Journal
DOI: 10.1088/0953-8984/21/36/364202 Document Type: Article |
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Times cited : (137)
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References (29)
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