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Plasma Sources Science and Technology
Volumn 11, Issue 3 A, 2002, Pages
Elementary processes and kinetics of H2 plasmas for different technological applications
(6)
Capitelli, M
a
Celiberto, R
b
Esposito, F
a
Laricchiuta, A
a
Hassouni, K
c
Longo, S
a
a
UNIVERSITY OF BARI
(
Italy
)
b
POLITECNICO DI BARI
(
Italy
)
c
UNIVERSITÉ PARIS 13
(
France
)
Author keywords
[No Author keywords available]
Indexed keywords
CARRIER CONCENTRATION; ELECTRON ENERGY LEVELS; HYDROGEN; MOLECULAR DYNAMICS; MOLECULAR VIBRATIONS; REACTION KINETICS;
ELECTRON-MOLECULE INTERACTION; HEAVY PARTICLE-MOLECULE INTERACTION; PLASMA KINETICS;
PLASMAS;
EID
:
0036672198
PISSN
:
09630252
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1088/0963-0252/11/3A/302
Document Type
:
Conference Paper
Times cited : (
56
)
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