Simulation and development of optimized microwave plasma reactors for diamond deposition

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 853-862

  Funer M ^a,b   Wild, C ^a   Koidl, P ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

^b AIXTRON AG   (Germany)

Author keywords

CVD; Diamond; Microwave plasma; Numerical simulation

Indexed keywords

COMPUTER SIMULATION; DIAMONDS; MATHEMATICAL MODELS; OPTIMIZATION; PLASMA DENSITY;

MICROWAVE PLASMA REACTORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0033338969     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00233-9     Document Type: Article

References (18)

1. Koidl P., Wild C., Füner M., Wörner E., Müller-Sebert W. Fujiwara S., et al. Super Carbon Proc. UMRS-ICA-97. 1998;117.
2. Wild C. Dischler B., Wild C. Low-Pressure Synthetic Diamond. 1998;Springer, Heidelberg.
3. Kamo M., Sato Y., Matsumoto S., Setaka N. J. Cryst. Growth. 62:1983;642.
4. Koidl P., Wild C., Wörner E., Müller-Sebert W., Füner M., Jehle M. Proc. 1st Int. Diam. Symp., Seoul. 1996;3.
5. Rau H., Trafford B. J. Phys. D. 22:1989;1613.
6. Hyman E., Tsang K., Lottati I., Drobot A., Lane B., Post R., Sawin H. Surf. Coat. Technol. 49:1991;387.
7. Tan W., Grotjohn T.A. Diamond Relat. Mater. 4:1995;1145.
8. Tan W., Grotjohn T.A. J. Vac. Sci. Technol. A. 12:1994;1216.
9. Füner M., Wild C., Koidl P. Surf. Coat. Technol. 221:1995;74.
10. Weiland T. Part. Accel. 17:1985;227.
11. Franz G. Oberflächentechnologie mit Niederdruckplasmen. 1994;Springer, Berlin.
12. Baden-Fuller A.J. Mikrowellen. 1974;Vieweg, Braunschweig.
13. Janzen G. Plasmatechnik. 1992;Hüthig, Heidelberg.
14. Metaxas A.C., Meredith R.J. Industrial Microwave Heating. Johns A.T., Ratcliff G., Platts J.R. IEE Power Engineering Series 4. 1983;238 Peregrinus, London.
15. MacDonald A.D., Brown S.C. Phys. Rev. 76:1949;11.
16. MacDonald A.D. Microwave Breakdown in Gases. 1978;Wiley, New York.
17. Bednorz J.G., Arend H. J. Cryst. Growth. 67:1984;660.
18. Füner M., Wild C., Koidl P. Appl. Phys. Lett. 72:1998;1149.