메뉴 건너뛰기




Volumn 203, Issue 1-2, 2008, Pages 148-155

Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films

Author keywords

Elemental composition; Hardness; Pulsed magnetron sputtering; Structure; TiAlN; Yttrium

Indexed keywords

ALUMINUM COATINGS; ELECTRON TEMPERATURE; HARDENING; HARDNESS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; ION BOMBARDMENT; MAGNETRON SPUTTERING; SPUTTERING; STRUCTURE (COMPOSITION); THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; YTTRIUM; YTTRIUM ALLOYS;

EID: 77649185164     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.08.042     Document Type: Article
Times cited : (33)

References (68)
  • 15
    • 84950154618 scopus 로고    scopus 로고
    • H.J. Grabke, M. Schütze Eds, Wiley-VCH GmbH, Weinheim
    • H.J. Grabke, M. Schütze (Eds.), Oxidation of Intermetallics, Wiley-VCH GmbH, Weinheim, 1998.
    • (1998) Oxidation of Intermetallics
  • 30
    • 85030580585 scopus 로고    scopus 로고
    • Vers. 2006
    • http://www.srim.org/, Vers. 2006.
  • 60
    • 0002173308 scopus 로고    scopus 로고
    • L. Hultman, Vacuum 57/1 (2000) 1.
    • (2000) Vacuum , vol.57 , Issue.1 , pp. 1
    • Hultman, L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.