Yttrium-induced structural changes in sputtered Ti1-xAlxN thin films

Scripta Materialia

Volumn 57, Issue 4, 2007, Pages 357-360

  Moser, M ^a   Mayrhofer, P H ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Ab initio electron theory; Metastable phases; Physical vapour deposition (PVD); Thin films; Yttrium

Indexed keywords

METASTABLE PHASES; PHYSICAL VAPOR DEPOSITION; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; YTTRIUM COMPOUNDS;

ELECTRON THEORY; MOLE FRACTIONS; PLASMA-ASSISTED VAPOR DEPOSITION; SOLUBILITY LIMITS;

THIN FILMS;

EID: 34250019129     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2007.04.019     Document Type: Article

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