Pulsed dc operation of a Penning-type opposed target magnetron

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 66-71

  Moiseev, T ^a   Cameron, D C ^a,b  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COPPER; CURRENT VOLTAGE CHARACTERISTICS; ELECTRONS; IONS; LIGHT EMISSION; PLASMAS;

DC OPERATION; ION FLUX; PENNING-TYPE MAGNETRON; PLASMA POTENTIAL;

MAGNETRON SPUTTERING;

EID: 31344444200     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1828086     Document Type: Article

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